This system uses inductively coupled plasma (ICP) source to achieve high-density plasma, enabling deep etching of silicon. It employs the Bosch proces...
The system uses a capacitive coupling plate (CCP) with RF power to generate a controlled plasma environment, ensuring precise deposition. It offers ex...
The system uses an inductively coupled plasma (ICP) source to generate a stable and uniform plasma, allowing for film growth at lower temperatures com...
The MLA 150 is a direct-write lithography system that uses a laser and digital micromirror array to expose patterns onto photoresist-coated substrates...
