The system uses a high-speed rotating diamond blade to make clean, narrow cuts with high accuracy. The system supports automatic or manual alignment a...
This system uses inductively coupled plasma (ICP) source to achieve high-density plasma, enabling deep etching of silicon. It employs the Bosch proces...
The system uses a capacitive coupling plate (CCP) with RF power to generate a controlled plasma environment, ensuring precise deposition. It offers ex...
The system uses an inductively coupled plasma (ICP) source to generate a stable and uniform plasma, allowing for film growth at lower temperatures com...
